HAN'S LASER Low Pressure Diffusion System

HAN'S LASER Low Pressure Diffusion System

  • HAN'S LASER Low Pressure Diffusion System
  • HAN'S LASER Low Pressure Diffusion System
Summary
HAN'S LASER Low Pressure Diffusion System represents a groundbreaking advancement in solar cell manufacturing, specifically designed to enhance the conversion efficiency of crystalline silicon solar cells through its innovative low-pressure diffusion technology. This cutting-edge system addresses the critical challenges of diffusion depth, uniformity, and productivity, setting new standards in the industry.More
Specifications
Process Method:
Soft Landing Closed Tube & Low Pressure Diffusion
Effective inner diameter of reaction tube:
Ø430mm
pressure control method:
Closed loop fully automatic
  • HAN'S LASER Low Pressure Diffusion System
Core Functionality & Advantages

Low-Pressure Diffusion Technology:

  • At the heart of this system lies-pressure diffusion capability, which significantly improves the molecular free path of the diffusion source. This not only optimizes the diffusion process but also ensures superior depth control and uniformity compared to traditional atmospheric pressure diffusion methods. The result is higher conversion efficiency and improved solar cell performance.

Enhanced Productivity & Process Repeatability:

  • The HAN'S LASER Low Pressure Diffusion System boasts high productivity, enabling manufacturers to scale up production efficiently while maintaining exceptional process repeatability. This ensures consistent quality output across batches, enhancing overall production efficiency. Low Source Consumption & Environmental Friendliness:
  • With its optimized diffusion process, the system consumes significantly less source material, reducing operational costs and minimizing waste. Furthermore, the entire process is designed to be clean and environmentally friendly, aligning with the global push towards sustainable energy solutions.

Main Features

  • Mature High-Capacity Process, Loading & Unloading System:

  • Featuring a balanced and symmetrical design, the system's loading and unloading system enhances operational stability, ensuring smooth and efficient handling of silicon wafers.

  • Rapid Cooling Furnace Body:

  • Equipped with the latest patented technology, the furnace body rapidly cools down to the required temperature, achieving a cooling rate increase of over 25%. This improvement significantly enhances temperature uniformity within the furnace tube, resulting in more consistent and predictable diffusion outcomes.

  • Efficient Exhaust Gas Management:

  • The system employs a high-efficiency water-cooled condenser to collect exhaust gases, ensuring the stable and reliable operation of pipes, filters, and diaphragm pumps. This design also extends maintenance intervals, reducing downtime and maintenance costs.

The HAN'S LASER Low Pressure Diffusion System is a testament to the company's commitment to innovation and excellence in solar cell manufacturing. By leveraging low-pressure diffusion technology, this system delivers unparalleled performance, efficiency, and environmental sustainability, making it an ideal choice for manufacturers seeking to enhance their production capabilities and drive the future of renewable energy.


Technical Specifications:
Item Technical Parameter
Process Method Soft Landing Closed Tube & Low Pressure Diffusion
Effective inner diameter of reaction tube Ø430mm
Loading capacity: Vertical loading method:1600pcs/ batch(166mm) , 1400pcs/batch (182mm) , 1200pcs/vatch (210mm) , 1200pcs/batch (230mm)
Horizontal loading method:2200pcs/batch(166mm) , 2000pcs/batch (182mm) , 1800pcs/batch(210mm) , 1600pcs/batch (230mm)
Square resistance and uniformity Intra-piece≤5% Inter-piece≤4% Inter-batch≤3%(166/182mm160Ω),
Intra-piece≤6% Inter-piece≤5% Inter-batch≤4%
(210/230mm160Ω)
Heating temperature Rt 1250°C
Range of working temperature 400 ~ 1100°C
Temperature control 6-point temperature control, internal and external dual-mode control
Heating method Automatic slope heating and fast constant temperature function
Cooling method The latest patented technology, 6 temperature zone section control active cooling furnace body
Accuracy and length of constant temperature zone ≤±0.5℃/2100mm(800~1100℃)/≤±1℃/2100mm(600~800℃)
Single point temperature stability ≤±0.5℃/4h(880℃)
Ship delivery method The SiC cantilever paddle is used for automatic horizontal feeding, and the loading speed is continuously adjustable from 20 to 1000mm/min; Positioning accuracy≤±1 mm;
The ultimate vacuum of the system 20mbar
System air leak rate The rate of pressure rise after the pump is stopped and the valve is closed:< 2 mbar /min .
pressure control method Closed loop fully automatic
Process control method Fully automatic, PLC + industrial computer, touch screen operation
Human-computer interaction interface LCD display, touch operation, process editing, online monitoring, authority management, team management, networking functions
MES Optional
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