Low-Pressure Diffusion Technology:
Enhanced Productivity & Process Repeatability:
Mature High-Capacity Process, Loading & Unloading System:
Featuring a balanced and symmetrical design, the system's loading and unloading system enhances operational stability, ensuring smooth and efficient handling of silicon wafers.
Rapid Cooling Furnace Body:
Equipped with the latest patented technology, the furnace body rapidly cools down to the required temperature, achieving a cooling rate increase of over 25%. This improvement significantly enhances temperature uniformity within the furnace tube, resulting in more consistent and predictable diffusion outcomes.
Efficient Exhaust Gas Management:
The system employs a high-efficiency water-cooled condenser to collect exhaust gases, ensuring the stable and reliable operation of pipes, filters, and diaphragm pumps. This design also extends maintenance intervals, reducing downtime and maintenance costs.
The HAN'S LASER Low Pressure Diffusion System is a testament to the company's commitment to innovation and excellence in solar cell manufacturing. By leveraging low-pressure diffusion technology, this system delivers unparalleled performance, efficiency, and environmental sustainability, making it an ideal choice for manufacturers seeking to enhance their production capabilities and drive the future of renewable energy.
| Item | Technical Parameter |
| Process Method | Soft Landing Closed Tube & Low Pressure Diffusion |
| Effective inner diameter of reaction tube | Ø430mm |
| Loading capacity: | Vertical loading method:1600pcs/ batch(166mm) , 1400pcs/batch (182mm) , 1200pcs/vatch (210mm) , 1200pcs/batch (230mm) Horizontal loading method:2200pcs/batch(166mm) , 2000pcs/batch (182mm) , 1800pcs/batch(210mm) , 1600pcs/batch (230mm) |
| Square resistance and uniformity | Intra-piece≤5% Inter-piece≤4% Inter-batch≤3%(166/182mm160Ω), Intra-piece≤6% Inter-piece≤5% Inter-batch≤4%(210/230mm160Ω) |
| Heating temperature | Rt 1250°C |
| Range of working temperature | 400 ~ 1100°C |
| Temperature control | 6-point temperature control, internal and external dual-mode control |
| Heating method | Automatic slope heating and fast constant temperature function |
| Cooling method | The latest patented technology, 6 temperature zone section control active cooling furnace body |
| Accuracy and length of constant temperature zone | ≤±0.5℃/2100mm(800~1100℃)/≤±1℃/2100mm(600~800℃) |
| Single point temperature stability | ≤±0.5℃/4h(880℃) |
| Ship delivery method | The SiC cantilever paddle is used for automatic horizontal feeding, and the loading speed is continuously adjustable from 20 to 1000mm/min; Positioning accuracy≤±1 mm; |
| The ultimate vacuum of the system | 20mbar |
| System air leak rate | The rate of pressure rise after the pump is stopped and the valve is closed:< 2 mbar /min . |
| pressure control method | Closed loop fully automatic |
| Process control method | Fully automatic, PLC + industrial computer, touch screen operation |
| Human-computer interaction interface | LCD display, touch operation, process editing, online monitoring, authority management, team management, networking functions |
| MES | Optional |

